Course title
7M1005001
Vacuum Technology and Surface Analysis

RZEZNICKA IZABELA IRENA
Course content
The vacuum technology and surface analysis course aims to introduce students to the basic aspects of vacuum technology and surface analysis used in materials development and engineering research.
Purpose of class
In the first part of the course, students will learn about the physical aspects of vacuum and instrumentation used to generate vacuum and ultra-high vacuum (UHV). Later on, students will learn about photon and electron detectors. Finally, several techniques used to characterize and analyze metals and semiconductor surfaces will be introduced.
Goals and objectives
  1. The students will be able to explain the differences of vacuum pumps and their applications.
  2. The students will be able to explain the differences of vacuum gauges and their applications.
  3. The students will be able to explain how electron and photon detectors are constructed and work.
  4. The students will be able to characterize surfaces of materials using electron and photon spectroscopies.
Relationship between 'Goals and Objectives' and 'Course Outcomes'

Reports Mid-term exam Final exam Total.
1. 0% 15% 5% 20%
2. 0% 15% 5% 20%
3. 10% 5% 15% 30%
4. 10% 5% 15% 30%
Total. 20% 40% 40% -
Language
English
Class schedule

Class schedule HW assignments (Including preparation and review of the class.) Amount of Time Required
1. Introduction to vacuum technology. Read indicated web resources. 190minutes
2. Kinetic theory of gases. Review basic gas laws. 190minutes
3. Vacuum generation. Vacuum pumps and components. Read handouts and web resources. 190minutes
4. Vacuum gauges. Read handouts and web resources. 190minutes
5. Photon detectors. Read handouts and web resources. 190minutes
6. Electron analyzers. Read handouts and web resources. 190minutes
7. Mid-term exam and discussion of solutions to the problems in the exam. Review material of classes 1-6. 300minutes
8. Auger electron spectroscopy. Read handouts and web resources. 190minutes
9. X-ray photon spectroscopy part I. Introduction Read handouts and web resources. 190minutes
10. X-ray photon spectroscopy part II. Applications Read handouts and web resources. 90minutes
Prepare report on selected application of XPS. 100minutes
11. Partial pressure analyzers. Mass spectrometers. Read handouts and web resources. 190minutes
12. Charged particles detectors. Secondary ion mass spectrometry. Read handouts and web resources. 190minutes
13. Surface structure analysis. Low-energy electron diffraction. Scanning tunneling microscopy. Read handouts and web resources. 90minutes
Prepare report on application of vacuum technology and surface analysis in semiconductor technology. 100minutes
14. Final exam and discussion of solutions to the problems in the exam. Review materials of classes 7-13 300minutes
Total. - - 2880minutes
Evaluation method and criteria
Evaluation will be performed on the basis of the reports (20%), mid-term exam (40%) and final exam (40%).
Students need at least 60% of the full score to pass this course.
Feedback on exams, assignments, etc.
ways of feedback specific contents about "Other"
Textbooks and reference materials
[1] G. Attard, C.Barnes – “Surfaces”; Oxford University Press 1998
[2] J. C. Vickerman – “Surface Analysis”; Wiley 1997
[3] "The physical basis of ultrahigh vacuum" by P.A. Redhead, American Vacuum Society Classics

Lecture slides will be electronically distributed before each class.
Prerequisites
Undergraduate level physics required.
Office hours and How to contact professors for questions
  • Contact via e-mail, the e-mail addresses to Dr. Izabela Rzeznicka: Izabela[at]shibaura-it.ac.jp
Regionally-oriented
Development of social and professional independence
    Active-learning course
    Course by professor with work experience
    Work experience Work experience and relevance to the course content if applicable
    N/A N/A
    Education related SDGs:the Sustainable Development Goals
      Last modified : Sat Feb 08 04:07:47 JST 2025